Substratum,hemi-spherical CpRu*w{
Flatness L/2 @633 nm on flat surface or better(specify). fJ&<iD)6
Figure irregularity L/10@633nm. !P60[*>
no chips exceeding ^o6)[_L
Thickness specified at the edge, all types. EOPS? @
Substratum BK7 D20×5 PCX f+ 300 mm SeNF!k% Y
有哪位哥哥姐姐懂的,帮忙翻译一下,诚谢!!