XUV光谱仪

XUV光谱仪是新型的像差校正平场入射X射线光谱仪，光谱范围可涵盖1-80nm.模块化设计，可以满足不同的实验条件和环境。
单光栅（标准配置）可覆盖5-80nm测量范围
技术参数

Zs5I?R1e8 波长范围	@R OY}CZ{/ 5-20	,5A>:2 zs 10-60	]tdo& 25-80
Mly z>< 光源距离（m）	q5\LdI2	4QKE{0NE 0.4-0.6	>NOYa3 0.5-1.5
"!6 B5Oz 平场尺寸（mm）	'MdE} 25.4	MZP><Je& 50	1=q?#PQ 50
5KH'\|z 色散(nm/mm)	0h@%q;g 0.5-0.7	6kF uMtjc 0.7-1.1	76i rb!- 0.9-1.3
im?XXsH' 光谱分辨率（nm）	f`9rTc 0.06	b%!`fn-; 0.09	(Y.$wMB 0.11
im?XXsH' 光谱分辨率（nm）	}AsF\W+5 0.02（CCD探测器）
>KClH'R2 升级波长范围	<9k}CXv2PK 可拓展至1-5nm(搭配该范围光栅)
'3u]-GU2_ 探测器选择	W];6u X-Ray 相机，MCP探测器，fiber taper系统
{O&liU4 光栅台	\IZ4(Z 电控
zHs 工作环境	ot+~\|Dl <10-6mbar
6% y) 操作性	"0 PN 极易安装使用，用户自己即可安装使用

•
技术优势介绍：
- Direct imaging of the source / Superior signal strength
In contrast to conventional devices our XUV spectrometer does not
require a narrow entrance aperture but rather images the harmonic source
directly onto the detector. Thus 80% or more of the incoming beam can be
used for measurement. Please see
http://www.hoerlein-partner.com/#!services/cihc for a sketch drawing.
This configuration typically collects 15 to 25 times more light than
standard versions, resulting in a signal-to-noise figure improved by the
same ratio.
In some experiments, this improved signal strength is the crucial step
for realizing a measurement at all.

- Flat-field imaging technology
Our instruments are based on high quality aberration-corrected
flat-field gratings. In contrast to conventional gratings these focus
all wavelengths onto a plane rather than a circle. This allows for
positioning the entire detector in the focal plane of the grating for
superior spectral resolution.

- Compactness / Modularity
The spectrometer is very compact and can be bolted directly to a vacuum
chamber. It is capable of carrying its own weight, no table required.
There are no externally moving parts.
Through its modular design, our spectrometer can be adapted to a number
of configurations (source distance, spectral range, detectors, vacuum
pumping, etc). This makes it highly flexible for varying requirements
and experiments.

- Robust against misalignment
The compact design of the spectrometer makes it inherently insensitive
against mechanical and environmental disturbances (vibrations,
acoustics, etc). No externally moving parts and closed-loop grating
actuators with absolute position monitoring add to the robustness and
allow for monitoring of the grating alignment at all times.
In addition, the concept of a spectrometer without entrance slit also
makes the instrument less sensitive to misalignment. Under typical
operating conditions a misalignment of the beam in the dispersion
direction on the entrance of the spectrometer by 500um would lead to a
signal reduction by more than 20% in an instrument with entrance slit
while it is less than 10% for our design.

- Customization
The adaptability of our XUV spectrometer makes it possible to highly
custom-fit the device to requirements. Thus we offer to customize every
spectrometer to exactly match the desired research application. This
includes e.g. interfacing to experimental chambers, adaption of the
source distance, integration of customer-supplied detectors,
user-defined filter mounts, non-magnetic instruments, special mounting
situations, etc.

典型客户：
1）苏黎世联邦理工学院
2） The Institute of Electronic Structure and Laser of the Foundation for Research and Technology-Hellas (IESL-FORTH)
3） MPQ
4） Los Alamos
5） Max Planck Institute
上海达灿光电科技有限公司
021-60450828

查看本帖完整版本: [-- XUV光谱仪 --] [-- top --]