| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications _Iy\,<
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目录： `%C -7D'?
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations $]2)r[eA)
for Nanostructure Fabrication Using Scanning /at7 H!
Probe Microscopy 1 4qQ,1&!]S
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo gYKz,$
Chapter 2 Atomic Force Microscope Lithography 33 Ed9Uw 7
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park 4-( kk0]`z
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, oUv26t~
Sensing, and Modification 65 >L7s[vKn
C. Santschi, J. Polesel-Maris, J. Brugger, ~3&{`9Y
and H. Heinzelmann ~4~`bT 9
Chapter 4 Using Biomolecules for Self-Assembly of Engineered "/W[gP[y%
Nano-Scale Structures and Devices 127 h!EA;2yGKa
R. Mehta, J. Lund, and B. A. Parviz f[ ^f/jGm
Chapter 5 Nanofabrication Based on Self-Assembled 2QfN .<[-
Alumina Templates 159 f-b],YE
S. Sen and N. A. Kouklin =&HL z
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Chapter 6 Nanowire Assembly and Integration 187 ,^(]zZh
Z. Gu and D. H. Gracias )#=J<OpG
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 ?e7]U*jEU
L. Tong and E. Mazur r* *zjv>
Chapter 8 Extreme Ultraviolet Lithography 235 wKV4-uyr
H. Kinoshita 0 'QWa{dS\
Chapter 9 Electron Projection Lithography 285 Uzu6>yT
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata bF'rK'',
Chapter 10 Electron Beam Direct Writing 341 cnv >&6a)
K. Yamazaki ccD+AGM.
Chapter 11 Electron Beam Induced Deposition 377 S{@}ECla
K. Mitsuishi
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Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 :{lwz#9V
P. A. Crozier and C. W. Hagen *H>rvE.K?
Chapter 13 Focused Ion Beams and Interaction with Solids 431 K2
T. Ishitani, T. Ohnishi, and T. Yaguchi [Kg b# L'{
Chapter 14 Nano/Microstructuring of Ceramic Surfaces bx@l6bpQ
by Unconventional Lithographic Methods 471 xO~ ElzGm
R. C. Salvarezza and O. Azzaroni 0#q=-M/?`
Chapter 15 Alternative Nanofabrication Approaches qe~x?FO_>
f or Non-CMOS Applications 499 wj|Zn+{"nF
C. V. Cojocaru, F. Cicoira, and F. Rosei 7e/+C{3v
Chapter 16 Nanofabrication of Nanoelectromechanical Systems MK$u }G
(NEMS): Emerging Techniques 543 gq?:n.;TY
K. L. Ekinci and J. Brugger M>8J_{r^
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