| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications ]TmxCTVL %IbG@}54 目录: +Ks! 9d*k< mt(2HBNoz %!i|"FNc Chapter 1 Atom, Molecule, and Nanocluster Manipulations (n,!v) for Nanostructure Fabrication Using Scanning :"oQ _bLT Probe Microscopy 1 6X@$xe847[ A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo oJEUNgY& Chapter 2 Atomic Force Microscope Lithography 33 N=oWIK<;- N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park q g+bh Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, AGdFJ>/ Sensing, and Modification 65 Dqw?3 KB C. Santschi, J. Polesel-Maris, J. Brugger, lp;=f and H. Heinzelmann nBA0LIb Chapter 4 Using Biomolecules for Self-Assembly of Engineered +$F_7Hx Nano-Scale Structures and Devices 127 Lh(`9(tX R. Mehta, J. Lund, and B. A. Parviz *l[;g Chapter 5 Nanofabrication Based on Self-Assembled 3bi,9 >% Alumina Templates 159 b&V}&9'[M; S. Sen and N. A. Kouklin Rn-RMD{dh Chapter 6 Nanowire Assembly and Integration 187 RN%*3{- Z. Gu and D. H. Gracias '!%Zf;Fjr Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 H?(I-vO L. Tong and E. Mazur I,@f*o Chapter 8 Extreme Ultraviolet Lithography 235 tJQFhY H. Kinoshita $#/-+> Chapter 9 Electron Projection Lithography 285 i.e1?Zk1 T. Miura, K. Suzuki, H. Arimoto, and S. Kawata $bd&$@sA Chapter 10 Electron Beam Direct Writing 341 #Wz7ju; K. Yamazaki |Ts|>"F' Chapter 11 Electron Beam Induced Deposition 377 v{Rj,Ou K. Mitsuishi Q3$AL@". Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 4[ 7)$ P. A. Crozier and C. W. Hagen "0(H! }D Chapter 13 Focused Ion Beams and Interaction with Solids 431 %` cP|k T. Ishitani, T. Ohnishi, and T. Yaguchi csPziH$wl Chapter 14 Nano/Microstructuring of Ceramic Surfaces H40~i=. by Unconventional Lithographic Methods 471 )\bA'LuFy R. C. Salvarezza and O. Azzaroni e7(iMe Chapter 15 Alternative Nanofabrication Approaches 'V=i;2mB* f or Non-CMOS Applications 499 2k}" 52 C. V. Cojocaru, F. Cicoira, and F. Rosei ky`xBO= Chapter 16 Nanofabrication of Nanoelectromechanical Systems IwfJDJJ (NEMS): Emerging Techniques 543 fR&;E K. L. Ekinci and J. Brugger ]}wo$7pO tf VK
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