| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications mp]UUpt
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations K ,HR= 5
for Nanostructure Fabrication Using Scanning ]=0D~3o3
Probe Microscopy 1 c%n% ,R>
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo '(($dT
Chapter 2 Atomic Force Microscope Lithography 33 Ce3
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park
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Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, )i.\q
Sensing, and Modification 65 <8Q?kj
C. Santschi, J. Polesel-Maris, J. Brugger, Zf\It<zT5
and H. Heinzelmann 6 ^p>f:5
Chapter 4 Using Biomolecules for Self-Assembly of Engineered Q F_K^(
Nano-Scale Structures and Devices 127 1\,wV,
R. Mehta, J. Lund, and B. A. Parviz ^yF2xJ)9-
Chapter 5 Nanofabrication Based on Self-Assembled f AR0GOI
Alumina Templates 159 U
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S. Sen and N. A. Kouklin z?_5fte`
Chapter 6 Nanowire Assembly and Integration 187 dG]s_lb9H
Z. Gu and D. H. Gracias j~9,Ct
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 ;V~~lcD&Y`
L. Tong and E. Mazur u"r1RG'
Chapter 8 Extreme Ultraviolet Lithography 235 O~g0 R6M6e
H. Kinoshita nr9c G/"
Chapter 9 Electron Projection Lithography 285 RE: $c!E!
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata 3PZwz^oRh9
Chapter 10 Electron Beam Direct Writing 341 h5# V,$
K. Yamazaki $3n@2 N`
Chapter 11 Electron Beam Induced Deposition 377 [W,maT M"
K. Mitsuishi o[eIwGxZ
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 Os7 3u#!'
P. A. Crozier and C. W. Hagen rU1{a" {
Chapter 13 Focused Ion Beams and Interaction with Solids 431 _52BIrAO2
T. Ishitani, T. Ohnishi, and T. Yaguchi al\ R(\p|
Chapter 14 Nano/Microstructuring of Ceramic Surfaces e_pyjaY!s
by Unconventional Lithographic Methods 471 GwVSRI:[N
R. C. Salvarezza and O. Azzaroni vo DTU]pf
Chapter 15 Alternative Nanofabrication Approaches =i)k@w_(x
f or Non-CMOS Applications 499 FmRa]31W
C. V. Cojocaru, F. Cicoira, and F. Rosei lN^} qg><
Chapter 16 Nanofabrication of Nanoelectromechanical Systems [HhdeLOX
(NEMS): Emerging Techniques 543 rRZ ,X%
K. L. Ekinci and J. Brugger vl}uHdeP9
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