| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications R00 eisd
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目录： ypy68_xyW
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations #Y4=J
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for Nanostructure Fabrication Using Scanning IyPwP*A
Probe Microscopy 1 k3uit+ge }
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo `|/<\
Chapter 2 Atomic Force Microscope Lithography 33 }b-g*dn]5
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park T7#W0^tj
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, svq<)hAf<
Sensing, and Modification 65 /bi}'H+#
C. Santschi, J. Polesel-Maris, J. Brugger, *" {lMZ +
and H. Heinzelmann `I3r3WyA
Chapter 4 Using Biomolecules for Self-Assembly of Engineered W' s
Nano-Scale Structures and Devices 127 i(NdGL#P
R. Mehta, J. Lund, and B. A. Parviz HbxL:~:}J
Chapter 5 Nanofabrication Based on Self-Assembled (,8$V\
Alumina Templates 159 V b= Mg
S. Sen and N. A. Kouklin hUF5fZqii
Chapter 6 Nanowire Assembly and Integration 187 WUh$^5W
Z. Gu and D. H. Gracias LS917ci-
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 dzDqZQY$
L. Tong and E. Mazur /%;mqrdk
Chapter 8 Extreme Ultraviolet Lithography 235 [_} J F}6
H. Kinoshita &8vCZN^
Chapter 9 Electron Projection Lithography 285 ekWePL;rR2
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata
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Chapter 10 Electron Beam Direct Writing 341 y $_eCmq
K. Yamazaki hBBUw0"
Chapter 11 Electron Beam Induced Deposition 377 o*o/q],C9-
K. Mitsuishi ])nPPf
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 E6pMT^{K
P. A. Crozier and C. W. Hagen 2u5|8
Chapter 13 Focused Ion Beams and Interaction with Solids 431 3G(miP6
T. Ishitani, T. Ohnishi, and T. Yaguchi L:i-BI`J
Chapter 14 Nano/Microstructuring of Ceramic Surfaces K5xX)oV
by Unconventional Lithographic Methods 471 .n~M(59
R. C. Salvarezza and O. Azzaroni |\7
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Chapter 15 Alternative Nanofabrication Approaches Yj6*NZ*
f or Non-CMOS Applications 499 t({W
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C. V. Cojocaru, F. Cicoira, and F. Rosei n\^Tq<] a
Chapter 16 Nanofabrication of Nanoelectromechanical Systems 23DiW#o'
(NEMS): Emerging Techniques 543 C,NJb+J
K. L. Ekinci and J. Brugger C,v(:ZE$J7
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