| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications P4"Pb\o*
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目录： j@4
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations ~ vD7BO`
for Nanostructure Fabrication Using Scanning 44H#8kV
Probe Microscopy 1 8&1 5k A
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo */=5m]
Chapter 2 Atomic Force Microscope Lithography 33 K".\ QF,:
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park 2?3D`
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Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, I] qml2
Sensing, and Modification 65 ~n)! e#p
C. Santschi, J. Polesel-Maris, J. Brugger, Yjv[rH5v
and H. Heinzelmann =NyN.^bwT
Chapter 4 Using Biomolecules for Self-Assembly of Engineered wRgh`Hc\}
Nano-Scale Structures and Devices 127 sOc<'):TK
R. Mehta, J. Lund, and B. A. Parviz e:9CD-
Chapter 5 Nanofabrication Based on Self-Assembled Vp =
Alumina Templates 159 <8U qV.&
S. Sen and N. A. Kouklin ld~8g,
Chapter 6 Nanowire Assembly and Integration 187
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Z. Gu and D. H. Gracias eyS V -f{
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 D q/ _#&S
L. Tong and E. Mazur __U;fH{c
Chapter 8 Extreme Ultraviolet Lithography 235 Am~ NBQ7
H. Kinoshita F...>%N$
Chapter 9 Electron Projection Lithography 285 M8Y\1#~
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata \cq
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Chapter 10 Electron Beam Direct Writing 341 +P C<#
K. Yamazaki rbP"
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Chapter 11 Electron Beam Induced Deposition 377 #u8|cs!
K. Mitsuishi &1hJ?uM01
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 &5&C
P. A. Crozier and C. W. Hagen D#>+]}5@x
Chapter 13 Focused Ion Beams and Interaction with Solids 431 ,BM6s,\
T. Ishitani, T. Ohnishi, and T. Yaguchi ny :c&XS
Chapter 14 Nano/Microstructuring of Ceramic Surfaces 3c5=>'^F
by Unconventional Lithographic Methods 471 q7}$F]UM"
R. C. Salvarezza and O. Azzaroni 3z Jbb3e
Chapter 15 Alternative Nanofabrication Approaches 0{ov LzW
f or Non-CMOS Applications 499 zh5{t0E}C
C. V. Cojocaru, F. Cicoira, and F. Rosei F(E3U'G
Chapter 16 Nanofabrication of Nanoelectromechanical Systems w$J0/eX{A
(NEMS): Emerging Techniques 543 &*TwEN^h
K. L. Ekinci and J. Brugger ^H'zS3S
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