| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications /qMiv7m~Q
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目录： 5>UQ 3hWo
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations l]j;0 i
for Nanostructure Fabrication Using Scanning FA := )
Probe Microscopy 1 ; 6PRi/@
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo u,{R,hTDS
Chapter 2 Atomic Force Microscope Lithography 33 @/: 7G.
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park O#p_ rfQ
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, j@Pd"
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Sensing, and Modification 65 HXC\``E
C. Santschi, J. Polesel-Maris, J. Brugger, %yd(=%)fMB
and H. Heinzelmann VMe
Chapter 4 Using Biomolecules for Self-Assembly of Engineered W*DK pJy
Nano-Scale Structures and Devices 127 4O.R=c2}7>
R. Mehta, J. Lund, and B. A. Parviz FBvh7D.hV
Chapter 5 Nanofabrication Based on Self-Assembled f~ /hsp~Hp
Alumina Templates 159 ijvDFyN>
S. Sen and N. A. Kouklin =vvd)og
Chapter 6 Nanowire Assembly and Integration 187 EUVD)+i t
Z. Gu and D. H. Gracias oI'& &Bt
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 sI h5 cT
L. Tong and E. Mazur !m%'aQHH(
Chapter 8 Extreme Ultraviolet Lithography 235 -7'|&zP
H. Kinoshita q'4P/2)va
Chapter 9 Electron Projection Lithography 285 (y~%6o 6
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata d R=0K
Chapter 10 Electron Beam Direct Writing 341 &328pOT4
K. Yamazaki ofw&? S k0
Chapter 11 Electron Beam Induced Deposition 377 !uO@4]:Y
K. Mitsuishi sINf/mv+
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 ,>za|y<n
P. A. Crozier and C. W. Hagen +\;Ro18?
Chapter 13 Focused Ion Beams and Interaction with Solids 431 O[{/P:a
T. Ishitani, T. Ohnishi, and T. Yaguchi ]9)iBvQlj
Chapter 14 Nano/Microstructuring of Ceramic Surfaces !] E ]Xd<
by Unconventional Lithographic Methods 471 r :$*pC&{
R. C. Salvarezza and O. Azzaroni ngmC~l*,
Chapter 15 Alternative Nanofabrication Approaches r!O[| h
f or Non-CMOS Applications 499 t&F:C
C. V. Cojocaru, F. Cicoira, and F. Rosei D _[NzCv<-
Chapter 16 Nanofabrication of Nanoelectromechanical Systems ]$ Nhy8-
(NEMS): Emerging Techniques 543 GB<.kOGQ[
K. L. Ekinci and J. Brugger q5JQx**g
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