| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications [g_f`ZJ=
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations :6N{~ [:4
for Nanostructure Fabrication Using Scanning \7*9l %
Probe Microscopy 1 j D$T
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo 8$xg\l0?KK
Chapter 2 Atomic Force Microscope Lithography 33 kJHUaX M
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park )k <ON~x
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, @6}c\z@AxM
Sensing, and Modification 65 Gzc{2"p
C. Santschi, J. Polesel-Maris, J. Brugger, MDl
and H. Heinzelmann Q5{i#F7nJm
Chapter 4 Using Biomolecules for Self-Assembly of Engineered IW uR=I$t
Nano-Scale Structures and Devices 127 5pE[}@-c9
R. Mehta, J. Lund, and B. A. Parviz T~=NY, n
Chapter 5 Nanofabrication Based on Self-Assembled D3(|bSca
Alumina Templates 159 C&Ow*~
S. Sen and N. A. Kouklin K, ?M5n '
Chapter 6 Nanowire Assembly and Integration 187 {$oZR" MP
Z. Gu and D. H. Gracias %+Mi~k*A'
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 qR Txg%
L. Tong and E. Mazur H_vOZ0
Chapter 8 Extreme Ultraviolet Lithography 235 @H1 pPr
H. Kinoshita rsOon2|
Chapter 9 Electron Projection Lithography 285 [[oX$0Fp\!
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata 1LT)%_d@
Chapter 10 Electron Beam Direct Writing 341 Y-gjX$qGo
K. Yamazaki ]^/:Xsk$
Chapter 11 Electron Beam Induced Deposition 377 ^HX={(ddK
K. Mitsuishi W446;)?5
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 #B;` T [
P. A. Crozier and C. W. Hagen Yg<o 9x$
Chapter 13 Focused Ion Beams and Interaction with Solids 431 Xv9kJ
T. Ishitani, T. Ohnishi, and T. Yaguchi Rfeiv
Chapter 14 Nano/Microstructuring of Ceramic Surfaces W>bhSK V%
by Unconventional Lithographic Methods 471 9 k& lq$
R. C. Salvarezza and O. Azzaroni % 7/XZQ
Chapter 15 Alternative Nanofabrication Approaches ZRsD n
f or Non-CMOS Applications 499 %:YON,1b=7
C. V. Cojocaru, F. Cicoira, and F. Rosei s80:.B
Chapter 16 Nanofabrication of Nanoelectromechanical Systems TW:vL~L
(NEMS): Emerging Techniques 543 g@`14U/|
K. L. Ekinci and J. Brugger C ZxQz
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