| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications QeAkuqT'[
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations 65A>p:OO
for Nanostructure Fabrication Using Scanning ;c>Rjg&[
Probe Microscopy 1 P(r}<SM
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo W,n0'";')
Chapter 2 Atomic Force Microscope Lithography 33 My'6 yQL
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park kjW`k?' s
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, ZGOI8M]@
Sensing, and Modification 65 &" svt2
C. Santschi, J. Polesel-Maris, J. Brugger, >&9Iy"
and H. Heinzelmann 8:A6Ew&\]O
Chapter 4 Using Biomolecules for Self-Assembly of Engineered 2\!.w^7'^T
Nano-Scale Structures and Devices 127 /SD2e@x{U
R. Mehta, J. Lund, and B. A. Parviz dkf?lmC+M
Chapter 5 Nanofabrication Based on Self-Assembled )Nq$~a Am
Alumina Templates 159 iyhB;s5Rgw
S. Sen and N. A. Kouklin B6Tn8@O
Chapter 6 Nanowire Assembly and Integration 187 1k>*
Z. Gu and D. H. Gracias @le2 3+q
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 0)qLW&
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L. Tong and E. Mazur M gLz:2
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Chapter 8 Extreme Ultraviolet Lithography 235 |3g:q
H. Kinoshita 7QRtNYo#\
Chapter 9 Electron Projection Lithography 285 UkL'h&J~
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata Hca)5$yL
Chapter 10 Electron Beam Direct Writing 341 /T*]RO4%>]
K. Yamazaki [XQoag;!
Chapter 11 Electron Beam Induced Deposition 377 lBTgI"n=eK
K. Mitsuishi D058=}^HE
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 T ~t%3 G
P. A. Crozier and C. W. Hagen UeT"v?zP
Chapter 13 Focused Ion Beams and Interaction with Solids 431 G\IH
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T. Ishitani, T. Ohnishi, and T. Yaguchi fr\UX }o
Chapter 14 Nano/Microstructuring of Ceramic Surfaces 66%kq [
by Unconventional Lithographic Methods 471 BiHBu8<
R. C. Salvarezza and O. Azzaroni 15gI-Qb
Chapter 15 Alternative Nanofabrication Approaches F+AShh
f or Non-CMOS Applications 499 =N
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C. V. Cojocaru, F. Cicoira, and F. Rosei gzHjD-g-<
Chapter 16 Nanofabrication of Nanoelectromechanical Systems $0K9OF9$
(NEMS): Emerging Techniques 543 :h3
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K. L. Ekinci and J. Brugger J]|-.Wv1
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