| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications *D.Ajd.G
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations : [7O=[pk
for Nanostructure Fabrication Using Scanning K D?b|y @
Probe Microscopy 1 W2'!Pc,W
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo K~B
Chapter 2 Atomic Force Microscope Lithography 33 Fu 5c_"!
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park m"QDc[^Ge
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, n~.$ iN
Sensing, and Modification 65 ^b.#4i (v
C. Santschi, J. Polesel-Maris, J. Brugger, 2f62 0
and H. Heinzelmann YrV@k*O*
Chapter 4 Using Biomolecules for Self-Assembly of Engineered dFy GI?
Nano-Scale Structures and Devices 127 \`E^>6!]q
R. Mehta, J. Lund, and B. A. Parviz A0:rn\$l3
Chapter 5 Nanofabrication Based on Self-Assembled MzDosr3:
Alumina Templates 159 X0R EC%
S. Sen and N. A. Kouklin 9Vo*AK'&U
Chapter 6 Nanowire Assembly and Integration 187 SZ}=~yoD(
Z. Gu and D. H. Gracias eze%RjO}
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 DTSf[zP/
L. Tong and E. Mazur ~]q>}/&YLo
Chapter 8 Extreme Ultraviolet Lithography 235 xF@&wg
H. Kinoshita e~d=e3m Bp
Chapter 9 Electron Projection Lithography 285 8QoxU"
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T. Miura, K. Suzuki, H. Arimoto, and S. Kawata 3&nN;4~Zx6
Chapter 10 Electron Beam Direct Writing 341 =1@LMIi5x
K. Yamazaki RB|i<`Z
Chapter 11 Electron Beam Induced Deposition 377 9\c]I0)3p
K. Mitsuishi 3bYjW=_hA
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 xiDgQTDz
P. A. Crozier and C. W. Hagen ?{e}ouKYX1
Chapter 13 Focused Ion Beams and Interaction with Solids 431 }>d
T. Ishitani, T. Ohnishi, and T. Yaguchi
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Chapter 14 Nano/Microstructuring of Ceramic Surfaces Qd{8.lB~LQ
by Unconventional Lithographic Methods 471 =^ i K^)
R. C. Salvarezza and O. Azzaroni .ESvMK~x
Chapter 15 Alternative Nanofabrication Approaches WTJ {M$
f or Non-CMOS Applications 499 gdA2u;q
C. V. Cojocaru, F. Cicoira, and F. Rosei I kw@B)0}
Chapter 16 Nanofabrication of Nanoelectromechanical Systems 8| )^m[c&
(NEMS): Emerging Techniques 543 O^j*"#f
K. L. Ekinci and J. Brugger &N._}ts
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