| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications Mw < 1
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations j&F&wRD%r
for Nanostructure Fabrication Using Scanning 8I*fPf
Probe Microscopy 1 HG3jmI+u>
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo g\ 2Y605DM
Chapter 2 Atomic Force Microscope Lithography 33 r*$KF!-dg
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park LGK}oL'
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, & )Z JT.S
Sensing, and Modification 65 'Z';$N ]
C. Santschi, J. Polesel-Maris, J. Brugger, &iTsuA/7
and H. Heinzelmann Mb-C DPT
Chapter 4 Using Biomolecules for Self-Assembly of Engineered 27)$;1MT:
Nano-Scale Structures and Devices 127 MYu -[Hg
R. Mehta, J. Lund, and B. A. Parviz ]:F]VRPT
Chapter 5 Nanofabrication Based on Self-Assembled 7p{lDQ
Alumina Templates 159
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S. Sen and N. A. Kouklin 5ES$qYN
Chapter 6 Nanowire Assembly and Integration 187 4o'0 lz]
Z. Gu and D. H. Gracias G'! Hc6OZ
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 gZ 9<H q
L. Tong and E. Mazur 'EXp[*
Chapter 8 Extreme Ultraviolet Lithography 235 /@q_`tU
H. Kinoshita h.PY$W<
Chapter 9 Electron Projection Lithography 285 q0Fy$e]u
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata WFTTBUoH
Chapter 10 Electron Beam Direct Writing 341 U j_%U2S$
K. Yamazaki 97Whn*
Chapter 11 Electron Beam Induced Deposition 377 U<Ag=vsZE
K. Mitsuishi =>&d[G[m!
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 jQc$>M<"o
P. A. Crozier and C. W. Hagen o d!TwGX
Chapter 13 Focused Ion Beams and Interaction with Solids 431 Ta~Ei=d^
T. Ishitani, T. Ohnishi, and T. Yaguchi zvE] 4}VL?
Chapter 14 Nano/Microstructuring of Ceramic Surfaces 8g$pfHt|e
by Unconventional Lithographic Methods 471 l]GLkE
R. C. Salvarezza and O. Azzaroni ` g3H; E
Chapter 15 Alternative Nanofabrication Approaches pX"f "
f or Non-CMOS Applications 499 Rzw}W7zg[
C. V. Cojocaru, F. Cicoira, and F. Rosei s(-$|f+s
Chapter 16 Nanofabrication of Nanoelectromechanical Systems iielAj*b
(NEMS): Emerging Techniques 543 h%Bp%Y9
K. L. Ekinci and J. Brugger r-=#C1eY&
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