| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications 3%
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目录： @ss):FwA
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations o) I/P<
for Nanostructure Fabrication Using Scanning |]uc HV
Probe Microscopy 1 0m=(W^c
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo 80&D""
Chapter 2 Atomic Force Microscope Lithography 33 , wK 1=7
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park > oY^Gx
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, A*0*sZ0
Sensing, and Modification 65 14l; *
C. Santschi, J. Polesel-Maris, J. Brugger, p":zrf'(6
and H. Heinzelmann ya zZw}};
Chapter 4 Using Biomolecules for Self-Assembly of Engineered Z_itu73I
Nano-Scale Structures and Devices 127 <\D Uo0]J
R. Mehta, J. Lund, and B. A. Parviz JDhwN<0R
Chapter 5 Nanofabrication Based on Self-Assembled FfYsSq2l
Alumina Templates 159 /'&v4C^y>
S. Sen and N. A. Kouklin h48 bb.p2
Chapter 6 Nanowire Assembly and Integration 187 x[Q&k[xV
Z. Gu and D. H. Gracias SIv[9G6
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 </ZHa:=7
L. Tong and E. Mazur shK &2Noan
Chapter 8 Extreme Ultraviolet Lithography 235 i+ic23$4M
H. Kinoshita 'j# a%j@{
Chapter 9 Electron Projection Lithography 285 78w4IICk
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata P"Rk? lL
Chapter 10 Electron Beam Direct Writing 341 ~@fanR =
K. Yamazaki (Y;'[.
Chapter 11 Electron Beam Induced Deposition 377 eT\p-4b
K. Mitsuishi . tp=T
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 +Ag#B*
P. A. Crozier and C. W. Hagen cYD1~J X.
Chapter 13 Focused Ion Beams and Interaction with Solids 431 -W^2*w
T. Ishitani, T. Ohnishi, and T. Yaguchi Q)d T(Td9~
Chapter 14 Nano/Microstructuring of Ceramic Surfaces :SeLkQC
by Unconventional Lithographic Methods 471 2Q
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R. C. Salvarezza and O. Azzaroni K#)bjxz
Chapter 15 Alternative Nanofabrication Approaches yu_gNro L
f or Non-CMOS Applications 499 7b,A Q 9
C. V. Cojocaru, F. Cicoira, and F. Rosei h@Dw'w
Chapter 16 Nanofabrication of Nanoelectromechanical Systems MM*-i=
(NEMS): Emerging Techniques 543 f#c BQ~
K. L. Ekinci and J. Brugger Cha?7F[xL
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