| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications 4@V <Suw f+W[]KK*PW 目录: 0T{Y_IG ;hJ/t/7 _$jJpy Chapter 1 Atom, Molecule, and Nanocluster Manipulations (k HQKQmq for Nanostructure Fabrication Using Scanning BrH`:Dw Probe Microscopy 1 JMe[
.Sx A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo 4sD:J-c Chapter 2 Atomic Force Microscope Lithography 33 a*wJcJTpV" N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park qFsg&< Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, ';L^mxh Sensing, and Modification 65 R8W44I*R: C. Santschi, J. Polesel-Maris, J. Brugger, LkbvA and H. Heinzelmann !iz vY Chapter 4 Using Biomolecules for Self-Assembly of Engineered n[w,x; Nano-Scale Structures and Devices 127 TXOW/{B R. Mehta, J. Lund, and B. A. Parviz 1R~WY'Ed Chapter 5 Nanofabrication Based on Self-Assembled OU3+SYM Alumina Templates 159 r`"#c7)
S. Sen and N. A. Kouklin 2B?i2[a, Chapter 6 Nanowire Assembly and Integration 187
q>oH(A Z. Gu and D. H. Gracias BNm va Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 7;-i_&vws L. Tong and E. Mazur :H8L (BsI Chapter 8 Extreme Ultraviolet Lithography 235 U\GZ
H. Kinoshita WM l ^XZO Chapter 9 Electron Projection Lithography 285 G(3la3\( T. Miura, K. Suzuki, H. Arimoto, and S. Kawata w3cK:
C0 Chapter 10 Electron Beam Direct Writing 341 `Q^Sm`R K. Yamazaki pPoC61F Chapter 11 Electron Beam Induced Deposition 377 e;u8G/ K. Mitsuishi .E8p-R5)V> Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 .`#R%4Xl P. A. Crozier and C. W. Hagen Gv3Fg[MA@c Chapter 13 Focused Ion Beams and Interaction with Solids 431 o[ W3/ T. Ishitani, T. Ohnishi, and T. Yaguchi +\$|L+@Z Chapter 14 Nano/Microstructuring of Ceramic Surfaces l%5%oN`4 by Unconventional Lithographic Methods 471 05LQh R. C. Salvarezza and O. Azzaroni _Vf|F Chapter 15 Alternative Nanofabrication Approaches R2ZQBwB f or Non-CMOS Applications 499 4'b]2Mn3 C. V. Cojocaru, F. Cicoira, and F. Rosei s3!LR2qiF Chapter 16 Nanofabrication of Nanoelectromechanical Systems &bgi0)> (NEMS): Emerging Techniques 543 D)Rf K. L. Ekinci and J. Brugger myX0<j3G5 wz)9/bL
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