| wildcat |
2009-11-17 18:28 |
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applics
美“纳米制造基础及应用” Nanofabrication - Fundamentals & Applications F Bk_LEcX
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目录： lO+6|oF0
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Chapter 1 Atom, Molecule, and Nanocluster Manipulations , z@"pI
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for Nanostructure Fabrication Using Scanning wR@"]WkR=
Probe Microscopy 1 "tX=^4
A. A. Tseng, S. D. Sartale, M. F. Luo, and C. C. Kuo ~jOn)jBRZ
Chapter 2 Atomic Force Microscope Lithography 33 3@*orm>em
N. Kawasegi, D. W. Lee, N. Morita, and J. W. Park 40i]I@:JK
Chapter 3 Scanning Probe Arrays for Nanoscale Imaging, L0QF(:F5
Sensing, and Modification 65 G[4$@{
C. Santschi, J. Polesel-Maris, J. Brugger, yKb+bm&5:'
and H. Heinzelmann HQ0fY
Chapter 4 Using Biomolecules for Self-Assembly of Engineered A@81wv
Nano-Scale Structures and Devices 127 g q|]t<'
R. Mehta, J. Lund, and B. A. Parviz G\4* 6iw:
Chapter 5 Nanofabrication Based on Self-Assembled ]hHL[hoFC
Alumina Templates 159 lXnzomU
S. Sen and N. A. Kouklin m2 esVvP
Chapter 6 Nanowire Assembly and Integration 187 c8<qn+=%?
Z. Gu and D. H. Gracias xa&5o`>1G
Chapter 7 Taper-Drawing Fabrication of Glass Nanowires 213 knb 9s `wR
L. Tong and E. Mazur 1RM@~I$0
Chapter 8 Extreme Ultraviolet Lithography 235 %K/zVYGm&
H. Kinoshita Hsl0|jy(/
Chapter 9 Electron Projection Lithography 285 eY'< UO
T. Miura, K. Suzuki, H. Arimoto, and S. Kawata =Ul{#R
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Chapter 10 Electron Beam Direct Writing 341 S?BI)shmg
K. Yamazaki umJ!j &(
Chapter 11 Electron Beam Induced Deposition 377 eWw#
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K. Mitsuishi e0 &x?U*/
Chapter 12 High-Resolution Electron-Beam-Induced Deposition 399 :41Ch^\E
P. A. Crozier and C. W. Hagen b>]MZhLJe
Chapter 13 Focused Ion Beams and Interaction with Solids 431 <>?7veN92
T. Ishitani, T. Ohnishi, and T. Yaguchi 2}<_l 2
Chapter 14 Nano/Microstructuring of Ceramic Surfaces H7Y :l0b
by Unconventional Lithographic Methods 471 *k^'xL
R. C. Salvarezza and O. Azzaroni _7=LSf,9
Chapter 15 Alternative Nanofabrication Approaches hwj:$m R
f or Non-CMOS Applications 499 q:a-td v2
C. V. Cojocaru, F. Cicoira, and F. Rosei *{fL t
Chapter 16 Nanofabrication of Nanoelectromechanical Systems *MD\YFXR
(NEMS): Emerging Techniques 543 WMk;-,S!)
K. L. Ekinci and J. Brugger s"- gnW
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